atomic layer deposition

Atomic Layer Deposition Reactor at the NTF Lab

Isvar A. Cordova

October 15, 2013

Atomic layer deposition (ALD) offers the ability to uniformly deposit conformal films over high aspect ratio nanostructure scaffolds with atomic precision. This makes ALD an extremely useful tool for the engineering of various nanomaterials. In our lab, we have constructed our own versatile ALD reactor to aid in the development of a wide range of nanodevices.


The Nanomaterials and Thin Films lab is equipped with the expertise and facilities to grow various carbon nanostructures through plasma enhanced chemical vapor deposition (PECVD) and metal oxides through an atomic layer deposition (ALD) reactor with in-vaccuo XPS and characterize their respective electrochemical behavior.

Recent research at the lab has focused on:

Nanomaterials and Thin Films Lab

Recent developments in the field of nanomaterials have resulted in exciting new possibilities in numerous applications. The research team at the Nanomaterials and Thin Films Lab, under the leadership of Professor Jeff Glass, is dedicated to exploring these possibilities in a scientific, innovative, and practical way.

Subscribe to RSS - atomic layer deposition