Atomic Layer Deposition Reactor at the NTF Lab

Isvar A. Cordova

October 15, 2013

Atomic layer deposition (ALD) offers the ability to uniformly deposit conformal films over high aspect ratio nanostructure scaffolds with atomic precision. This makes ALD an extremely useful tool for the engineering of various nanomaterials. In our lab, we have constructed our own versatile ALD reactor to aid in the development of a wide range of nanodevices.

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