NTFL Publishes Article on Nanomaterials for Electron Lithography

The journal Applied Physics Letters recently published an article by several members of the NTFL. The paper, "Monolayer Graphene-Insulator-Semiconductor Emitter for Large-Area Electron Lithography" describes the fabrication of electron field emission devices and their use in an electron lithography system. Read about this exciting step toward affordable nanomanufacturing here!

Kirley, M. P.; Aloui, T.; Glass, J. T. Monolayer Graphene-Insulator-Semiconductor Emitter for Large-Area Electron Lithography. Appl. Phys. Lett. 2017, 110, 233109. DOI: 10.1063/1.4984955