NTFL Researchers Present at International Atomic Layer Deposition Conference

July 20, 2015

NTFL Research scientist, Dr. Qing Peng, and graduate student, Isvar Cordova, recently attended the 15th International Conference on Atomic Layer Deposition (ALD) in Portland, where they gave a poster presentation on their work titled "Surface Reaction of TiO2 onto ITO, FTO, and ATO."

This work studied the temperature-dependent reactions that affect the nature of the interface formed when TiCl4 is used as a precursor during the ALD of TiO2 onto various transparent conductive oxides. These findings have particularly important ramifications for many photoelectrochemical and photovoltaic applications.